In-Situ Temperature Control for Rtp Via Thermal Expansion Measurement

Precise determination of lattice parameter and thermal expansion coefficient of silicon between 300 and 1500 K

Yasumasa Okada, Yozo Tokumaru · Journal of Applied Physics · 1984 · 1.2K citations

Natural Sciences, Materials Engineering, Materials Science +17

Thermal and stress analysis of semiconductor wafers in a rapid thermal processing oven

H. A. Lord · IEEE Transactions on Semiconductor Manufacturing · 1988 · 192 citations

Engineering, Materials Engineering, Materials Science +17

Noncontact, 1 °C resolution temperature measurement by projection moiré interferometry

Saleem H. Zaidi, S. R. J. Brueck, John R. McNeil · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1992 · 17 citations

Engineering, Materials Engineering, Materials Science +17