An Investigation of Dose Rate and Source Dependent Effects in 200 GHz SiGe HBTs

Abstract

<para xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> We present an investigation of the observed variations in the total dose tolerance of the emitter-base spacer and shallow trench isolation oxides in a commercial 200 GHz SiGe HBT technology. Proton, gamma, and X-ray irradiations at varying dose rates are found to produce drastically different degradation signatures at the various oxide interfaces. Extraction and analysis of the radiation-induced excess base current, as well as low-frequency noise, are used to probe the underlying physical mechanisms. Two-dimensional calibrated device simulations are employed to correlate the observed results to the spatial distributions of carrier recombination in forward- and inverse-mode operation for both pre- and post-irradiation levels. Possible explanations of our observations are offered and the implications for hardness assurance testing are discussed. </para>