Publication | Closed Access
Resistance increase due to electromigration induced depletion under TSV
73
Citations
16
References
2011
Year
Unknown Venue
Electrical EngineeringElectromigration TechniqueEngineeringSpecific ResistanceAnalytical ModelApplied PhysicsTime-dependent Dielectric BreakdownResistance IncreaseComputational ElectromagneticsElectronic PackagingMatter Depletion FlowElectrical InsulationElectromagnetic Compatibility
This paper focuses on the EM induced voiding in a line ended by a TSV, and proposes an analytical model based on the link between the monitored electrical resistance increase and the matter depletion flow.
| Year | Citations | |
|---|---|---|
Page 1
Page 1