Positive Resists Based on Non-polymeric Macromolecules

Abstract

Derivatives of Polyhedral Oligomeric Silsesquioxanes (POSS) and Oligosaccharides have been investigated as potential candidates for high resolution resists. POSS materials are cage compounds with defined mono-disperse molecular weights. Oligosaccharides are carbohydrates with defined number of monosaccharide units (2 to10) and may be cyclic or linear. These materials are attractive candidates for molecular resist development because of their commercial availability and the ease with which they can be derivatized. We have developed high resolution positive resists suitable for 193-nm and other emerging lithographic applications based on these materials.