Electrochemical and Solid-State Letters · 2003 · 10 citations · 8 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsThin FilmsSemiconductor InterfacesSemiconductor SurfacesSemiconductor Thin FilmsThin Film AnnealingThin Film Electrical PropertiesThin-film MaterialsLeakage CurrentLeakage Current AnalysisNegative Temperature Coefficient Of ResistanceRapid Thermal AnnealingResistorsSchottky BarriersTemperature Dependence Of ResistanceThermal Annealing
The temperature coefficient of resistance (TCR) characteristics of (BST)/Pt thin-film resistors are studied for the BST films with rapid thermal annealing (RTA) treatments. The polarizations induced by bias voltages greatly influence the TCR characteristics. The RTA-treated BST thin film exhibits negative TCR (NTCR) behavior at a negative voltage, but, intriguingly, positive TCR (PTCR) behavior at a positive voltage. According to the leakage current analysis, Schottky emission dominates the negatively biased current at the upper interface, but Heywang barrier scattering confines the positive biased current. © 2003 The Electrochemical Society. All rights reserved.
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