IEEE Journal of Selected Topics in Quantum Electronics · 2009 · 32 citations · 20 references
EngineeringMechanical EngineeringMechatronics EngineeringActuatorsMicroelectromechanical SystemsMicrofabricationMems ActuatorsMems DesignMems FabricationMicrofabrication ProcessesMicromachiningBimorph ActuatorsDeep Reactive Ion EtchingElectrothermal ActuatorsMicroelectromechanical ActuatorsMicroelectromechanical System FabricationMicromirrorsSilicon-on-insulator TechnologySingle-crystal Silicon
In this paper, we present the design, simulation, fabrication, and characterization of a two-axis gimbal-less micromirror optimized for large-angle circumferential scanning applications. The single-crystal silicon micromirror consists of novel folded bimorph electrothermal actuators, flexural springs, and a mirror plate coated with a high-reflective Cr/Au thin film. A modified silicon-on-insulator microelectromechanical system process has been applied on the micromirror fabrication. The single-wafer process is based on deep reactive ion etching in order to achieve high fill factor as well as small outline of the micromirror chip. A new mechanical design of bimorph actuators is developed to further increase the mechanical deflection. Both theoretical and experimental results demonstrate that the micromirror can provide a uniform mechanical deflection up to ~9deg with multichannel driving voltages of less than 2.3 V to any angle in full 360deg circumference.
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