The structure and properties of chromium nitride coatings deposited using dc, pulsed dc and modulated pulse power magnetron sputtering

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W. C. Oliver, George M. Pharr · Journal of materials research/Pratt's guide to venture capital sources · 1992 · 26.1K citations

Elastic Modulus, Improved Technique, Engineering +11

Microstructural evolution during film growth

I. Petrov, P.B. Barna, Lars Hultman et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2003 · 1.7K citations

Materials Science, Engineering, Crystalline Defects +15

A novel pulsed magnetron sputter technique utilizing very high target power densities

V. Kouznetsov, K. Macák, Jochen M. Schneider et al. · Surface and Coatings Technology · 1999 · 1K citations

Electrical Engineering, Engineering, Magnetron Sputter Technique +3

Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering

J. E. Greene, J.‐E. Sundgren, Lars Hultman et al. · Applied Physics Letters · 1995 · 392 citations

Materials Science, Magnetism, Materials Engineering +15

High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering

André Anders, Joakim Andersson, Arutiun P. Ehiasarian · Journal of Applied Physics · 2007 · 340 citations · Full text

Materials Engineering, Electrical Engineering, Engineering +12