Experimental and analytical properties of 0.2 micron wide, multi-layer, GMR, memory elements

A.V. Pohm, R.S. Beech, J.M. Daughton, B.A. Everitt, E.Y. Chen, M. Durlam, Kevin J. Nordquist, Tiancong Zhu, S. Tehrani

IEEE Transactions on Magnetics · 1996 · 10 citations · 2 references

Concepts

Abstract

Memory elements 0.2 microns wide made from multilayer GMR material have been studied experimentally and analytically. When etched into narrow elements, the 12 to 15% material exhibits a memory mode with large outputs of /spl plusmn/8%. Analysis shows that the mode is suitable for multi-megabit die with high performance if yield can be achieved.

References

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