Micro-Raman Temperature Measurements for Electric Field Assessment in Active AlGaN–GaN HFETs

Abstract

Temperature profiles in the source/drain (S/D) opening of a single finger AlGaN-GaN heterostructure field-effect transistor were studied at increasing S/D voltages by micro-Raman spectroscopy with <1 μm spatial resolution. These profiles imply high field regions near the gate edge of length /spl sim/0.4 μm for S/D voltages between 45 and 75 V. Electric field strengths of /spl sim/1.2 and /spl sim/1.9 MV/cm are estimated for 45 and 75 V S/D voltage. The experimental results are in excellent agreement with 2-D Monte Carlo simulations.