Fabrication of large area nanostructured magnets by interferometric lithography

Abstract

Patterned arrays of magnetic elements may be useful as media for high density magnetic storage applications. Interferometric lithography has been used to fabricate arrays of cobalt and nickel pillars with periods of 200 nm over areas of 5 cm/spl times/5 cm using a UV laser. This provides an economical and rapid method for manufacturing particle arrays.