Non-contact VLSI imaging using a scanning electric potential microscope

Abstract

We describe the design and use of a novel scanning microscope which detects changes in electric potential above a surface. We demonstrate that this can be employed to image integrated circuits of considerable complexity in various modes of operation and at a spatial resolution of m. We discuss the advantages of applying this imaging technique to the non-invasive evaluation of very large scale integrated circuits and consider possible limits to its resolution and sensitivity in this role.