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Development of sub-10-nm atomic layer deposition barriers for Cu/low-k interconnects

Materials ScienceElectrical EngineeringEngineeringNanoelectronicsSurface ScienceApplied PhysicsSemiconductor MaterialSemiconductor Device FabricationChemical DepositionMicroelectronicsCu/low-k InterconnectsChemical Vapor DepositionInterconnect (Integrated Circuits)