Progress in extreme ultraviolet interferometric and holographic lithography

Abstract

The Center for Nanotechnology has developed an advanced beamline dedicated to nanopatterning using the radiation from a new undulator on the Aladdin storage ring at the Synchrotron Radiation Center of the University of Wisconsin-Madison. Computer generated holograms and transmission interferometric gratings were fabricated and tested on the new extreme ultraviolet (EUV) exposure system. The authors have developed an accurate model, based on Fresnel-Kirchhoff integral diffraction theory, to analyze performance of real EUV interferometric and holographic lithography systems.