Publication | Closed Access
Interferometric <i>in situ</i> alignment for UV-based nanoimprint
29
Citations
5
References
2004
Year
Materials ScienceEngineeringElectron-beam LithographyBeam LithographyMicrofabricationNanomaterialsNanotechnologyOverlay AccuracyApplied PhysicsConsecutive Alignment StepsUv-based Nanoimprint LithographyFabrication TechniqueNanolithographyNanofabricationNanometrologyUv-based Nanoimprint3D PrintingNanolithography Method
A high precision alignment concept is evaluated for suitability in UV-based nanoimprint lithography. Through three consecutive alignment steps an overlay accuracy of 50nm is obtained with ample room for further improvements.
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