Optical emission spectroscopy as a tool for designing and controlling the deposition of graded TiAlN layers by ECR-assisted reactive RF sputtering

Phase formation and characterization of hard coatings in the TiAlN system prepared by the cathodic arc ion plating method

Tsutomu Ikeda, Hiroshi Satoh · Thin Solid Films · 1991 · 304 citations

Engineering, Materials Engineering, Materials Science +17

The development of the PVD coating TiAlN as a commercial coating for cutting tools

T. Leyendecker, O. Lemmer, S. Esser et al. · Surface and Coatings Technology · 1991 · 185 citations

Engineering, Materials Engineering, Materials Science +12

Radio frequency or microwave plasma reactors? Factors determining the optimum frequency of operation

Michel Moisan, C. Barbeau, R. Claude et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1991 · 172 citations

Natural Sciences, Electrical Engineering, Physics +15

A model for development of orientation of vapour deposits

Dong Nyung Lee · Journal of Materials Science · 1989 · 117 citations

Natural Sciences, Earth Sciences, Petroleum Engineering +9

Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical-vapor deposition

L. Martinů, J.E. Klemberg-Sapieha, O.M. Küttel et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 115 citations

Natural Sciences, Materials Science, Physics +17