Japanese Journal of Applied Physics · 1992 · 20 citations · 2 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsCarrier TransportDopingSemiconductor Device MaterialsSemiconductor HeterostructuresSemiconductor PhysicsSemiconductor ReliabilityAnnealingDevice DegradationElectron-hole RecombinationHeterojunction Bipolar TransistorsInterstitial DiffusionReliability DegradationThermal AnnealingThermal Annealing Effects
Current-induced degradation of current-voltage ( I-V ) characteristics in AlGaAs/GaAs heterojunction bipolar transistors (HBTs) with Be-doped base layers is investigated. Large shifts of emitter-base on-voltage (Δ V BE ) are observed during high current operation. The behavior of degradation is qualitatively explained in terms of interstitial Be diffusion in combination with the electron-hole recombination process. Thermal annealing in As overpressure can successfully stabilize the characteristics. Degradation is not observed in AlGaAs/GaAs HBTs with C-doped base layers without the Zn diffusion process.
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MOCVD grown carbon-doped graded-base AlGaAs/GaAs HBTs
Hiroshi Itô · Electronics Letters · 1990 · 14 citations