IEEE Electron Device Letters · 2011 · 118 citations · 11 references
EngineeringComputer EngineeringElectrical EngineeringMemoryMicroelectronicsSemiconductor DevicesDevice ModelingDevice ScalingDevice SimulationMemory DevicesMetal-oxide-semiconductor Field-effect TransistorsMos CapacitorsCharge StorageDynamic Random-access MemoryDynamic Random-access Memory DesignMemory Circuit DesignMemory Device SimulationRandom-access MemorySilicon-on-insulator CmosSilicon-on-insulator Technology
We demonstrate experimentally a capacitor-less one-transistor dynamic random access memory (DRAM) based on fully depleted silicon-on-insulator substrate. In our device, the charges are directly stored in front gate capacitor ( <i xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">C</i> <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">G</sub> ) and read out through a fast feedback regeneration process. The simulated read/write times of our device reach below 1 ns, much faster than conventional 1T-1C DRAM. The read/write biasing voltages can be scaled down to 1.1 V, achieving long retention time (t <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">re</sub> >; 5s).
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Stable SRAM cell design for the 32 nm node and beyond
L. Chang, David Fried, J. M. Hergenrother et al. · 2005 · 567 citations
Engineering, Computer Engineering, Electrical Engineering +17