New substances for atomic-layer deposition of silicon dioxide

An FT-IR study of silicon dioxides for VLSI microelectronics

Wolfgang Bensch, W. Bergholz · Semiconductor Science and Technology · 1990 · 72 citations

Natural Sciences, Materials Engineering, Materials Science +17

Cyanates of Silicon, Phosphorus and Boron. Instability of Certain Ternary Boron Compounds

George S. Forbes, Herbert H. Anderson · Journal of the American Chemical Society · 1940 · 66 citations

Natural Sciences, Chemistry, Materials Science +6

Quasi-monolayer deposition of silicon dioxide

Werner Gasser, Yasutaka Uchida, Masakiyo Matsumura · Thin Solid Films · 1994 · 55 citations

Natural Sciences, Materials Engineering, Materials Science +14

Anisotropic spin transport in oriented lithium phthalocyanine thin films

H. Wachtel, J. C. Wittmann, Bernard Lotz et al. · Thin Solid Films · 1994 · 31 citations

Natural Sciences, Materials Science, Physics +14