Multiple scale integrated modeling of deposition processes

Microtrenching resulting from specular reflection during chlorine etching of silicon

Robert J. Hoekstra, Mark J. Kushner, Valeriy Sukharev et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 109 citations

Natural Sciences, Materials Science, Physics +16

Multiscale modeling of chemical vapor deposition

S. Rodgers, Klavs F. Jensen · Journal of Applied Physics · 1998 · 94 citations

Engineering, Chemical Engineering, Computational Engineering +17

A Multiscale Simulator for Low Pressure Chemical Vapor Deposition

Matthias K. Gobbert, T. Merchant, L. Borucki et al. · Journal of The Electrochemical Society · 1997 · 64 citations · Full text

Engineering, Chemical Engineering, Chemistry +17

Design and modeling of chemical vapor deposition reactors

W.L. Holstein · Progress in Crystal Growth and Characterization of Materials · 1992 · 54 citations

Engineering, Chemical Engineering, Nuclear Engineering +12

Molecular dynamics-based ion-surface interaction models for ionized physical vapor deposition feature scale simulations

Daniel G. Coronell, David E. Hansen, Arthur F. Voter et al. · Applied Physics Letters · 1998 · 45 citations

Natural Sciences, Materials Engineering, Materials Science +15