Daniel G. Coronell

Molecular dynamics simulation of Cu and Ar ion sputtering of Cu (111) surfaces

Joel D. Kress, David E. Hanson, Arthur F. Voter et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 78 citations

Engineering, Ar Ion Sputtering, Molecular Dynamics Simulation +22

Analysis of MOCVD of GaAs on patterned substrates

Daniel G. Coronell, Klavs F. Jensen · Journal of Crystal Growth · 1991 · 76 citations

Electrical Engineering, Engineering, Applied Physics +3

Molecular dynamics-based ion-surface interaction models for ionized physical vapor deposition feature scale simulations

Daniel G. Coronell, David E. Hansen, Arthur F. Voter et al. · Applied Physics Letters · 1998 · 45 citations

Engineering, Material Simulation, Computational Chemistry +17

Analysis of Transition Regime Flows in Low Pressure Chemical Vapor Deposition Reactors Using the Direct Simulation Monte Carlo Method

Daniel G. Coronell, Klavs F. Jensen · Journal of The Electrochemical Society · 1992 · 38 citations

Engineering, Reactor Physics, Simulation +23

Simulation of Rarefied Gas Transport and Profile Evolution in Nonplanar Substrate Chemical Vapor Deposition

Daniel G. Coronell, Klavs F. Jensen · Journal of The Electrochemical Society · 1994 · 30 citations

Engineering, Nonplanar Cvd, Thin Film Process Technology +20