Frequency-selective contrast on variably doped p-type silicon with a scanning microwave microscope

Abstract

We report on frequency-dependent contrast in d(S11)/dV measurements of a variably doped p-type silicon sample in the frequency range from 2 GHz to 18 GHz. The measurements were conducted with a scanning microwave microscope. The measurements were done at selected frequencies while varying the DC tip voltage. The measured d(S11)/dV signal shows a maximum for doping concentrations (NA) of 1015 cm−3−1016 cm−3 at 2.3 GHz. As the microscope operating frequency is increased, this maximum sequentially “switches” through the regions of increasing dopant concentration, displaying a maximum for NA of 1017 cm−3−1018 cm−3 at 17.9 GHz. The frequency dependent “switching” is attributed to the physics of tip-to-sample interaction, particularly as related to the frequency-dependent local surface resistance and the depletion capacitance that control the RC time constant of tip-to-sample interaction. This provides a unique platform for local, frequency-selective, spatially resolved microwave spectroscopy of semiconducting materials.