Roughness Assessment of Polysilicon Using Power Spectral Density

Abstract

Atomic force microscopy (AFM) has been used to investigate the surface morphology of polysilicon deposits grown under two different temperature conditions. We also present results obtained with scanning tunneling microscopy (STM) and transmission electron microscopy (TEM). Surface morphology data have been quantitatively analysed and compared using standard roughness criteria such as the root mean square of the surface roughness. Moreover, spatial frequency analysis of roughness power spectrum is used to determine characteristic dimensions in the surface plane.