Surface reconstruction of hydrogen annealed (100) silicon

Abstract

The hydrogen termination and surface reconstruction of (100) silicon annealed at high temperature in a H2 atmosphere at 1 bar is investigated with multiple internal reflection infrared spectroscopy and atomic force microscopy. The surface flattens and becomes 2×1 reconstructed and terminated by strained monohydrides. This surface is shown to be very stable against contamination and oxidation.