Publication | Closed Access
The effect of change of voltage acceleration on temperature activation of oxide breakdown for ultrathin oxides
30
Citations
18
References
2001
Year
Materials ScienceElectrical EngineeringEngineeringTemperature ActivationPhysicsVoltage-dependent Voltage AccelerationNanoelectronicsStress-induced Leakage CurrentOxide ElectronicsApplied PhysicsBias Temperature InstabilityOxidation ResistanceTime-dependent Dielectric BreakdownVoltage AccelerationElectronic PackagingOxide BreakdownMicroelectronicsElectrical Insulation
We report the effect of change of voltage acceleration on temperature dependence of oxide breakdown for ultra-thin oxides below 6 nm. The time- or charge-to-breakdown (T/sub BD//Q/sub BD/) is directly measured over a wide range of temperatures (-30/spl deg/C to 200/spl deg/C) for several fixed voltages using different area capacitors and long-term stress. Using extensive experimental evidence, we unequivocally demonstrate that this strong temperature dependence of oxide breakdown on ultra-thin oxides is not a thickness effect as previously suggested at least for thickness range investigated in this work. It is a consequence of two experimental facts: 1) voltage-dependent voltage acceleration and 2) temperature-independent voltage acceleration within a fixed T/sub BD/ window. These results provide a coherent picture for T/sub BD/ in both voltage and temperature domains for ultra-thin oxides.
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