Oxidation behavior of (Ti1 − xAlx)N films perpared by r.f. reactive sputtering

Titanium aluminum nitride films: A new alternative to TiN coatings

Wolf‐Dieter Münz · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 947 citations

Natural Sciences, Materials Engineering, Materials Science +17

Oxidation of metastable single-phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanisms

D.C. McIntyre, J. E. Greene, G. Håkansson et al. · Journal of Applied Physics · 1990 · 536 citations

Natural Sciences, Materials Engineering, Materials Science +17

On structure and properties of sputtered Ti and Al based hard compound films

O. Knotek, M. Böhmer, T. Leyendecker · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 397 citations

Natural Sciences, Materials Engineering, Materials Science +17

Oxidation kinetics of TiN thin films

M. Wittmer, J. R. Noser, H. Melchior · Journal of Applied Physics · 1981 · 286 citations

Natural Sciences, Materials Engineering, Materials Science +17

Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter deposition

G. Håkansson, J.‐E. Sundgren, D.C. McIntyre et al. · Thin Solid Films · 1987 · 238 citations

Natural Sciences, Materials Engineering, Materials Science +16