On structure and properties of sputtered Ti and Al based hard compound films

Abstract

After investigating basic correlations between process and film characteristics in previous works new multicomponent hard coatings, on the basis of Ti–Al and Ti–Zr, have been deposited by magnetron sputtering. These ternary and quaternary nitrides are crystallizing in a face centered cubic TiN lattice with reduced or enlarged lattice parameters depending on the amount and the radius of foreign atoms. Improved wear behavior compared to chemical vapor deposition (CVD) TiN coatings has been stated with (Ti,Al)N, (Ti,Zr)N, and (Ti,Al,V)N coatings. According to these results the development of the coating material itself will be of major interest in the future.