Chemical Vapor Deposition · 2008 · 40 citations · 23 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials ChemistrySurface ScienceThin FilmsAluminum OxidesAtomic Layer DepositionCoating ProcessesCoating TechnologyCoatingsThin-film MaterialsElectrochemical Corrosion MechanismsElectrochemical Corrosion ProcessesFiber CoatingsMetallic CoatingsMetallic Thin FilmsOxidation-resistant CoatingsThermal OxidationThin Oxide Films
Abstract The potential of atomic layer deposition (ALD) in the coating of highly porous, 0.5 mm thick, metal fiber matrices is explored. Three different reactor types are compared for ALD of Al 2 O 3 thin films from trimethylaluminum and water. Both an evacuation‐type and a flow‐type process are successful in forming conformal Al 2 O 3 coatings on the fibers. The coatings are able to protect the fibers against electrochemical corrosion and thermal oxidation. In addition, a metallic Ir thin film is deposited by ALD on one of the Al 2 O 3 ‐coated fiber matrices. This kind of a structure could be used, for example, as a catalytic filter.
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