Concepedia

Etch rate behaviour of SiO2 films chemically vapour deposited from silane, oxygen and nitrogen gas mixtures at low temperatures

C. Pavelescu, C. Cobianu, L. Condriuc, E. Segal

Thin Solid Films · 1984 · 11 citations · 5 references

DOI

Concepts

References

5

Comparison of properties of dielectric films deposited by various methods

W. A. Pliskin · Journal of Vacuum Science and Technology · 1977 · 484 citations

, , +17

Determination of the density and the relaxation time of silicon-metal interfacial states

C. Barret, A. Vapaille · Solid-State Electronics · 1975 · 69 citations

, , +14

A Theoretical Study of the Low‐Temperature Chemical Vapor Deposition of SiO2 Films

C. Cobianu, C. Pavelescu · Journal of The Electrochemical Society · 1983 · 45 citations

, , +17

Efficiency of the SiH4 oxidation reaction in chemical vapour deposition of SiO2 films at low temperature

C. Cobianu, C. Pavelescu · Thin Solid Films · 1983 · 34 citations

, , +17

An Infrared Absorption Study of LTCVD Silicon Dioxide

C. Pavelescu, C. Cobianu, A. Vancu · Journal of The Electrochemical Society · 1983 · 21 citations

, , +17