Plasma-emission-controlled d.c. magnetron sputtering of TiO2-x thin films

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William H. Press, Saul A. Teukolsky · Computers in Physics · 1990 · 11.8K citations · Full text

Computing, Aerospace Engineering, Optics +2

Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode

S. Schiller, G. Beister, William K. Sieber · Thin Solid Films · 1984 · 145 citations

Natural Sciences, Materials Engineering, Materials Science +17

Optical reflection and transmission formulae for thin films

S G Tomlin · Journal of Physics D Applied Physics · 1968 · 145 citations

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High rate reactively sputtered TiN coatings on high speed steel drills

William D. Sproul, Robert A. Rothstein · Thin Solid Films · 1985 · 108 citations

Engineering, Materials Engineering, Materials Science +10

Process modeling of reactive sputtering

S. Berg, Hans‐Olof Blom, Mona Moradi et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 103 citations

Natural Sciences, Materials Engineering, Materials Science +13