Fabrication of organic interfacial layers by molecular layer deposition: Present status and future opportunities

Abstract

To keep pace with the miniaturization of next generation devices in applications such as electronics, biotechnology, and energy, their constituent polymer thin films must meet challenging requirements such as providing simultaneously ultrathin and conformal coatings. Traditional polymer deposition methods may not be suitable, and as a result, new fabrication methods are needed. Molecular layer deposition (MLD), as an analog to atomic layer deposition, provides precise control over many polymer film properties, such as thickness, composition, morphology, and conformality. Hence, MLD can be a powerful and novel method for fabrication of polymer films. This review article introduces the variety of polymer films that have been developed using MLD together with important film growth characteristics and properties. Examples of MLD polymer applications are provided as well. Finally, challenges and outlooks of the MLD technique are discussed.