Semiconductor Science and Technology · 1986 · 63 citations · 27 references
Natural SciencesMaterials SciencePhysicsCondensed Matter PhysicsSemiconductor MaterialsSpectroscopyLaser SpectroscopyMagnetic Properties Of SolidsOptical Properties Of SemiconductorsOptical Properties Of SolidsOptical SpectroscopySemiconductor PhysicsEpitaxial Thin FilmsFourier Transform Infrared SpectroscopyHydrostatic PressureMagneto-optical EffectsPressure Variation EffectsSemiconductor Characterization
Far-infrared laser spectroscopy and Fourier spectroscopy are used in order to study the influence of hydrostatic pressure on shallow donor and cyclotron resonance spectra in high-purity epitaxial films of n-GaAs. Accurate pressure variations for the effective mass and dielectric constant are obtained at a temperature of 4.2K and pressures of up to 17.3kbar. These parameters are subsequently used to interpret the pressure variation of the chemical shifts of the 1s and 2s levels. It is shown that the dependence of these chemical shifts on magnetic field at fixed pressure can be described well by lowest-order perturbation theory. The ratio of the chemical shifts of the 1s level to the corresponding chemical shifts of the 2s level at zero magnetic field is found to be pressure independent and equal to 7.2+or-0.3 for all donors. A much stronger increase of chemical shifts than that predicted by lowest-order perturbation theory is observed on increasing pressure. In addition, a resonant interaction of the 1s level of the deepest shallow donor with a strongly localised level of the same impurity centre is observed on increasing pressure. A qualitative interpretation of all these phenomena is given.
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Theory of Donor States in Silicon
W. Kohn, J. M. Luttinger · Physical Review · 1955 · 769 citations
Dependence of the direct energy gap of GaAs on hydrostatic pressure
B. Welber, M. Cardona, C. K. Kim et al. · Physical review. B, Solid state · 1975 · 325 citations