Dose-dependence of ion implantation-caused damage in silicon measured by ellipsometry and backscattering spectrometry - Concepedia

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Dose-dependence of ion implantation-caused damage in silicon measured by ellipsometry and backscattering spectrometry

18

Citations

13

References

2004

Year

M. Fried, P. Petrík, T. Lohner, N.Q. Khánh, O. Polgár, J. Gyulai

Thin Solid Films

Ion ImplantationIon Implantation-caused DamageBackscattering SpectrometryApplied PhysicsMass SpectrometrySingle Event EffectsInstrumentationIon EmissionMedicineDosimetrySilicon Debugging

References

	Year	Citations

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