Investigation and characterisation of silicon nitride and silicon carbide thin films

Low hydrogen content stoichiometric silicon nitride films deposited by plasma-enhanced chemical vapor deposition

Gregory N. Parsons, Jun H. Souk, J. Batey · Journal of Applied Physics · 1991 · 212 citations

Natural Sciences, Materials Science, Physics +17

Microstructure and properties of silicon nitride thin films deposited by reactive bias magnetron sputtering

Joo Han Kim, Ki Woong Chung · Journal of Applied Physics · 1998 · 116 citations

Natural Sciences, Materials Engineering, Materials Science +17

Determination of bonding in amorphous carbons by electron energy loss spectroscopy, Raman scattering and X-ray reflectivity

Andrea C. Ferrari, B. Kleinsorge, George Adamopoulos et al. · Journal of Non-Crystalline Solids · 2000 · 90 citations · Full text

Natural Sciences, Materials Science, Physics +14

Low temperature deposition of nanocrystalline silicon carbide thin films

S. Kerdilès, A. Berthelot, F. Gourbilleau et al. · Applied Physics Letters · 2000 · 83 citations

Natural Sciences, Materials Engineering, Materials Science +17

Observation of multiple defect states at silicon–silicon nitride interfaces fabricated by low-frequency plasma-enhanced chemical vapor deposition

Jan Schmidt, F.M. Schuurmans, W.C. Sinke et al. · Applied Physics Letters · 1997 · 61 citations

Natural Sciences, Materials Science, Physics +17