Optical lithography: Present status and continuation below 0.25 μm

Improving resolution in photolithography with a phase-shifting mask

M. D. Levenson, R. A. Simpson · IEEE Transactions on Electron Devices · 1982 · 646 citations

Engineering, Electrical Engineering, Manufacturing Engineering +15

Microcircuit Engineering '84

M.E. Jones · IEE Proceedings I Solid State and Electron Devices · 1986 · 173 citations

New Concepts in Projection Mask Aligners

Abe Offner · Optical Engineering · 1975 · 150 citations

Natural Sciences, Physics, Biomedical Optics +12

New imaging technique for 64M-DRAM

Naomasa Shiraishi, Shigeru Hirukawa, Yuichiro Takeuchi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1992 · 78 citations

Natural Sciences, Biomedical Engineering, Digital Imaging +12

A new method for enhancing focus latitude in optical lithography: FLEX

Hiroshi Fukuda, Norio Hasegawa, Toshihiko Tanaka et al. · IEEE Electron Device Letters · 1987 · 24 citations

Natural Sciences, Physics, Optical Materials +11