Shigeru Hirukawa

New imaging technique for 64M-DRAM

Naomasa Shiraishi, Shigeru Hirukawa, Yuichiro Takeuchi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1992 · 78 citations

Engineering, Microscopy, Optic Design +18

Effects of laser bandwidth on OPE in a modern lithography tool

K. E. Huggins, Tsuyoshi Toki, Meng Tong Ong et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 21 citations

Optical Engineering, Optical Materials, Engineering +22

Double patterning requirements for optical lithography and prospects for optical extension without double patterning

Andrew J. Hazelton, Shinji Wakamoto, Shigeru Hirukawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 20 citations

Optical Materials, Engineering, Electron-beam Lithography +18

Full-field exposure tools for immersion lithography

Soichi Owa, Hiroyuki Nagasaka, Yuuki Ishii et al. · Optical Microlithography XVIII · 2005 · 16 citations

Optical Engineering, Light Field Imaging, Optical Materials +14

Development of polarized-light illuminator and its impact

Hisashi Nishinaga, Noriaki Tokuda, Soichi Owa et al. · Optical Microlithography XVIII · 2005 · 14 citations

Illumination Modeling, Light Field Imaging, Optical Materials +14