Journal of Applied Physics · 1980 · 49 citations · 12 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials ChemistrySemiconductor MaterialsSpectroscopyAmorphous MaterialsAmorphous SemiconductorsAmorphous SolidsElectronic Material CharacterizationOxide SemiconductorsSilicon MaterialsAmorphous Oxide SemiconductorsAmorphous OxidesAmorphous SiliconElectron Energy LossElectron Energy-loss SpectroscopySilicon CharacterizationSilicon ChemistrySilicon Nitride
For amorphous SiO2 and Si3N4 the Auger spectra were measured and an interpretation of the Si(LVV) spectra is given based upon electron energy-level schemes, derived from electron energy-loss spectroscopy results obtained at the same samples. For Si-nitride the effect of oxygen content (O/N from 0.02 to 1) and Ar+ ion bombardment was studied and it is shown that discrepancies between the spectra of different authors are mainly due to these effects.
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Optical Properties of Silicon Nitride
Herbert R. Philipp · Journal of The Electrochemical Society · 1973 · 466 citations
Electron-irradiation effect in the Auger analysis of SiO2
S. Thomas · Journal of Applied Physics · 1974 · 198 citations