Applied Physics Letters · 1992 · 16 citations · 10 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsCarrier TransportCharge Carrier TransportDopingSemiconductor Crystal GrowthSemiconductor Device MaterialsSemiconductor PhysicsCarrier Transport In SemiconductorsCarrier Transport MechanismsDoped SemiconductorsElectron Transport In SemiconductorsGallium ArsenideMetalorganic Chemical Vapor DepositionSemiconductor ConductivityTransport In Semiconductors
Minority carrier electron mobilities and diffusion lengths in p-type C-doped GaAs have been measured at room temperature and 77 K using the zero field time of flight (ZFTOF) technique on p+–n structures with p+ carrier concentrations of 1.1×1019, 6.0×1018, 1.8×1018 cm−3, which were grown by low-pressure metalorganic chemical vapor deposition (MOCVD) using CCl4 as the dopant. The electron mobilities obtained are higher than those reported for Be-doped MBE GaAs but lower than those reported for Ge-doped, LPE GaAs, while the diffusion lengths are similar to those found in similar concentration Be-doped samples.
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Material properties of <i>p</i>-type GaAs at large dopings
Sandip Tiwari, Steven L. Wright · Applied Physics Letters · 1990 · 109 citations · Full text
Electron mobility in <i>p</i>-type GaAs
M. I. Nathan, W. P. Dumke, K. Wrenner et al. · Applied Physics Letters · 1988 · 55 citations