Large Area AlGaN/GaN HEMTs Grown on Insulating Silicon Carbide Substrates

R. Lossy, Nidhi Chaturvedi, P. Heymann, J. W�rfl, S. M�ller, K. K�hler

physica status solidi (a) · 2002 · 21 citations · 1 references

Concepts

Abstract

Large periphery Al0.25Ga0.75N/GaN-HEMTs on SiC-substrates are fabricated on a 2-inch process line using stepper lithography. DC characteristics reveal current densities above 1.2 A/mm and intrinsic transconductances of 360 mS/mm. Depending on device size the maximum frequency of oscillation fmax varies from 27–79 GHz. With these devices a power density of 5.2 W/mm and a power level of 13.8 W is achieved at 2 GHz.

References

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