Publication | Closed Access
High density fluorocarbon plasma etching of new resists suitable for nano-imprint lithography
18
Citations
6
References
2000
Year
Materials ScienceElectrical EngineeringNano-imprint LithographyEngineeringElectron-beam LithographyMicrofabricationNanoelectronicsNanotechnologySurface ScienceApplied PhysicsBeam LithographyPrinted ElectronicsNanolithographyNew ResistsMicroelectronicsPlasma EtchingNanolithography Method
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