M. C. Peignon

Characterisation of TiN coatings and of the TiN/Si interface by X-ray photoelectron spectroscopy and Auger electron spectroscopy

Pierre-Yves Jouan, M. C. Peignon, Christophe Cardinaud et al. · Applied Surface Science · 1993 · 196 citations

Natural Sciences, Materials Engineering, Materials Science +11

Selective and deep plasma etching of SiO2: Comparison between different fluorocarbon gases (CF4, C2F6, CHF3) mixed with CH4 or H2 and influence of the residence time

Freddy Gaboriau, Gilles Cartry, M. C. Peignon et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 68 citations · Full text

Engineering, Materials Engineering, Materials Science +17

New polymer materials for nanoimprinting

H. Schulz, Hella‐Christin Scheer, Thomas Hoffmann et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 68 citations

Natural Sciences, Materials Engineering, Materials Science +16

Etching mechanisms of Si and SiO₂in fluorocarbon ICP plasmas: analysis of the plasma by mass spectrometry, Langmuir probe and optical emission spectroscopy

Freddy Gaboriau, Gilles Cartry, M. C. Peignon et al. · Journal of Physics D Applied Physics · 2006 · 50 citations

Natural Sciences, Materials Science, Physics +17

Etching processes of tungsten in SF6-O2 radio-frequency plasmas

M. C. Peignon, Christophe Cardinaud, G. Turban · Journal of Applied Physics · 1991 · 42 citations

Natural Sciences, Materials Science, Physics +17