Publication | Closed Access
Improved electrical characteristics high-k gated MOS devices with in-situ remote plasma treatment in atomic layer deposition
16
Citations
7
References
2013
Year
Electrical CharacteristicsElectrical EngineeringMos DevicesEngineeringIon ImplantationNanoelectronicsSurface ScienceApplied PhysicsMicroelectronicsChemical Vapor DepositionAtomic Layer DepositionSemiconductor Device
| Year | Citations | |
|---|---|---|
Page 1
Page 1