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AlGaN/GaN HEMTs on SiC with f/sub T/ of over 120 GHz
225
Citations
11
References
2002
Year
Gan-based HemtsWide-bandgap SemiconductorElectrical EngineeringEngineeringF/sub T/Rf SemiconductorNanoelectronicsApplied PhysicsAluminum Gallium NitrideSemi-insulating SicGan Power DeviceAlgan/gan HemtsPower SemiconductorsPeak Extrinsic Transconductance
AlGaN/GaN high electron mobility transistors (HEMTs) grown on semi-insulating SiC substrates with a 0.12 μm gate length have been fabricated. These 0.12-μm gate-length devices exhibited maximum drain current density as high as 1.23 A/mm and peak extrinsic transconductance of 314 mS/mm. The threshold voltage was -5.2 V. A unity current gain cutoff frequency (f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> ) of 121 GHz and maximum frequency of oscillation (f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> ) of 162 GHz were measured on these devices. These f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> and f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> values are the highest ever reported values for GaN-based HEMTs.
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