Publication | Closed Access
Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy
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Citations
13
References
2000
Year
Materials ScienceEngineeringBeam LithographyMicrofabricationNanoelectronicsNanotechnologySurface ScienceApplied PhysicsOptical Emission SpectroscopySemiconductor Device FabricationEnd Point DetectionSilicon On InsulatorMicroelectronicsPlasma EtchingNanolithography MethodReactive Ion
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