G. Haindl - Concepedia

Author

G. Haindl

Bielefeld University

Also Known As

G Haindl, G. Haindl, Gabriele Haindl

Publications

366

Citations

H-Index

Concepts

All Affiliations

Bielefeld University Technical University of Darmstadt Slovak Academy of Sciences Peking University State Key Laboratory of Nuclear Physics and Technology

About

G. Haindl is an author at Bielefeld University specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	333
2	Applied Physics	8	8	333
3	Materials Science	8	8	333
4	Electrical Engineering	3	3	167
5	Materials Engineering	1	1	12

G. Haindl

Publications

333

Citations

H-Index

Page 1

	Year	Citations
Optimized chemical bath deposited CdS layers for the improvement of CdTe solar cells Junfeng Han, Christina Spanheimer, G. Haindl, Solar Energy Materials and Solar Cells Materials ScienceIi-vi SemiconductorElectrical EngineeringOptimized Chemical BathEngineering	2010	112
CdTe thin film solar cells: Interrelation of nucleation, structure, and performance J. Luschitz, B. Siepchen, J. Schaffner, Thin Solid Films Materials ScienceIi-vi SemiconductorEngineeringOrganic Solar CellApplied Physics	2008	72
Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth Y.C. Lim, Th. Westerwalbesloh, A. Aschentrup, Applied Physics A Materials SciencePhotonicsOptical MaterialsEngineeringOptical Properties	2001	50
An optimized multilayer structure of CdS layer for CdTe solar cells application Junfeng Han, Cheng Liao, Tao Jiang, Journal of Alloys and Compounds Materials ScienceSemiconductorsElectrical EngineeringIi-vi SemiconductorEngineering	2010	32
Annealing effects on the chemical deposited CdS films and the electrical properties of CdS/CdTe solar cells Junfeng Han, Cheng Liao, Tao Jiang, Materials Research Bulletin Materials ScienceIi-vi SemiconductorElectrical EngineeringEngineeringApplied Physics	2010	23
Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD Frank Hamelmann, G. Haindl, J. Schmalhorst, Thin Solid Films Materials ScienceEngineeringNanoelectronicsOxide ElectronicsSurface Science	2000	19
Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy L. Dreeskornfeld, R. Segler, G. Haindl, Microelectronic Engineering Materials ScienceEngineeringBeam LithographyMicrofabricationNanoelectronics	2000	13
Thermal stability of W1−xSix/Si multilayers under rapid thermal annealing R. Senderák, M. Jergel, Š. Luby, Journal of Applied Physics Materials EngineeringMaterials ScienceThermal Stability IncreasesW1−xsix/si MlsEngineering	1997	12

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