Applied Physics Letters · 2005 · 22 citations · 10 references
EngineeringElectrical EngineeringPhysicsElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsP-n JunctionsSemiconductor HeterostructuresSemiconductor PhysicsSemiconductor ReliabilityWide Band Gap SemiconductorsWide-bandgap SemiconductorsAvalanche BreakdownBreakdown MechanismsDeep-level DefectsElectric Field IonizationElectric Field ScreeningElectron Impact IonizationIonizationNative Defects
We discuss the dynamic impact ionization breakdown of a high voltage p-n junction which occurs when the electric field is increased above the threshold of avalanche impact ionization on a time scale smaller than the inverse thermogeneration rate. The avalanche-to-streamer transition characterized by generation of dense electron-hole plasma capable of screening the applied external electric field occurs in such regimes. We argue that the experimentally observed deterministic triggering of the plane streamer front at the electric-field strength above the threshold of avalanche impact ionization, yet below the threshold of band-to-band tunneling, is generally caused by field-enhanced ionization of deep-level centers. We suggest that the process-induced sulfur centers and native defects such as EL2, HB2, and HB5 centers initiate the front in Si and GaAs structures, respectively. In deep-level-free structures the plane streamer front is triggered by Zener band-to-band tunneling.
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Native defects in gallium arsenide
J. C. Bourgoin, H. J. von Bardeleben, D. Stiévenard · Journal of Applied Physics · 1988 · 394 citations
Quenched-in centers in silicon p+n junctions
L.D. Yau, C. T. Sah · Solid-State Electronics · 1974 · 72 citations