Concepedia

400-Å high aspect-ratio lines produced in poylmethyl methacrylate (PMMA) by ion-beam exposure

Applied Physics Letters · 1979 · 38 citations · 3 references

Concepts

EngineeringMaterials EngineeringMaterials ScienceMicrofabricationPolymer ChemistrySurface ScienceHolographyMask DesignMask FabricationMicrofabrication MaterialsSurface ModificationThin Film LithographyFocused Ion Beam LithographyFocused Ion Beam PatterningPolymethyl MethacrylateThin-film Mask Design

Abstract

We report preliminary results on the fabrication of 400- and 2600-Å deep lines in polymethyl methacrylate (PMMA) by means of H+ exposure through a holographically produced fine conformal gold mask.

References

3

Range and stopping-power tables for heavy ions

L. C. Northcliffe, Roland Schilling · Atomic Data and Nuclear Data Tables · 1970 · 2.7K citations

Natural Sciences, Nuclear Engineering, Physics +13

250-Å linewidths with PMMA electron resist

A. N. Broers, J. M. E. Harper, W. W. Molzen · Applied Physics Letters · 1978 · 137 citations

Engineering, Materials Engineering, Materials Science +13

Surface relief structures with linewidths below 2000 Å

D. C. Flanders, Henry I. Smith, H. W. Lehmann et al. · Applied Physics Letters · 1978 · 36 citations · Full text

Engineering, Materials Engineering, Materials Science +13