Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity

Abstract

The electromagnetic standing wave effect can become the main source of nonuniformity limiting the use of very high frequency in large area reactors exceeding 1m2 required for industrial applications. Recently, it has been proposed and shown experimentally in a cylindrical reactor that a shaped electrode in place of the conventional flat electrode can be used in order to suppress the electromagnetic standing wave nonuniformity. In this study, we show experimental measurements demonstrating that the shaped electrode technique can also be applied in large area rectangular reactors. We also present results of electromagnetic screening by a conducting substrate which has important consequences for industrial application of the shaped electrode technique.