Development of a freestanding copper antiscatter grid using deep X-ray lithography

Use of SU-8 photoresist for very high aspect ratio x-ray lithography

A. L. Bogdanov, Sergey Peredkov · Microelectronic Engineering · 2000 · 131 citations

Materials Science, High Aspect, Su-8 Photoresist +14

Anti-scattering X-ray grid

Cha‐Mei Tang, E. Stier, K. Fischer et al. · Microsystem Technologies · 1998 · 27 citations

Anti-scattering X-ray Grid, Engineering, Physics +3

Alternative resist adhesion and electroplating layers for LIGA process

A. El‐Kholi, Klaus J. Bade, J. J. Mohr et al. · Microsystem Technologies · 2000 · 20 citations

Materials Science, Engineering, Microfabrication +4

X-Ray masks for very deep X-Ray lithography

J. Klein, H. Guckel, D. P. Siddons et al. · Microsystem Technologies · 1998 · 18 citations

Engineering, Electron-beam Lithography, Beam Lithography +6

Evaluation of alternative development process for high-aspect-ratio poly(methylmethacrylate) microstructures in deep x-ray lithography

Chantal Khan Malek, Sasi Yajamanyam · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 16 citations

Engineering, Electron-beam Lithography, Mechanical Engineering +16