Publication | Closed Access
Use of SU-8 photoresist for very high aspect ratio x-ray lithography
131
Citations
5
References
2000
Year
Materials ScienceHigh AspectSu-8 PhotoresistEngineeringElectron-beam LithographyMicroscopyMicrofabricationOptical PropertiesX-ray DiffractionApplied PhysicsBeam LithographyComputational ImagingX-ray LithographyX-ray Optic3D PrintingNanolithography MethodX-ray Imaging
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