Journal of Applied Physics · 1990 · 86 citations · 7 references
EngineeringElectrical EngineeringPhysicsCondensed Matter PhysicsSemiconductor DevicesSemiconductor MaterialsCarrier TransportElectron-phonon InteractionsElectronic Transport ModelingIii-v SemiconductorsSemiconductor DefectsSemiconductor PhysicsCarrier ScatteringElectron-phonon ScatteringHole TransportImpurity ScatteringScatteringTransport In SemiconductorsValence BandValence Band Structure
In this paper, we discuss and compare the rates for dominant scattering mechanisms for holes in semiconductors, including ionized impurity scattering, polar and nonpolar optical-phonon scattering, and inelastic acoustic deformation potential scattering. The scattering rates for these mechanisms have been reviewed for the purpose of finding reliable expressions to be used in Monte Carlo simulation of hole transport in p-type III-V semiconductor devices. In the scarce literature on hole scattering rates, we have found several discrepancies. Here, we present corrected rates for ionized impurity scattering and for scattering by polar optical phonons. In addition, we have derived new expressions for the inelastic acoustic deformation potential scattering rates where we also have included a series expansion for the phonon occupation number, beyond the equipartition approximation.
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Electron drift velocity in silicon
C. Canali, Carlo Jacoboni, F. Nava et al. · Physical review. B, Solid state · 1975 · 502 citations